Atomic
layer deposition is a deposition technique capable of producing
thin films of a variety of materials. Majority of the reactions
taking place in the atomic layer deposition use multiple chemicals
called precursors that react with the surface of a material in a
sequential manner. Key applications of atomic layer deposition
include electronic displays, optical data storage devices, electronic
components, and the biomedical field. Atomic layer deposition offers
several advantages and disadvantages over conventional techniques,
such as physical vapor deposition (PVD) and chemical vapor deposition
(CVD) techniques, due to its conformality and control over the
material’s thickness and composition.
This
deposition technique provides a controlled method to produce a film
of specified thickness. Atomic layer deposition is beneficial in the
field of nanotechnology and microelectronics to produce small and
efficient semiconductors. However, atomic layer deposition
instruments are expensive, and prices are based on the efficiency and
quality of the instrument. Additionally, it is important to select a
suitable substrate for use in microelectronics. These substrates are
difficult to obtain and can be expensive.
Growth
in the end-user industries is expected to boost the demand for atomic
layer deposition instruments. The electronics industry is growing at
a rapid rate, especially in the emerging economies of Asia Pacific
and Latin America. This is expected to fuel the demand for atomic
layer deposition instruments. Additionally, rising demand for
miniaturized components and development of nanotechnology is
anticipated to propel the demand for atomic layer deposition
instruments. Semiconductor industries are likely to invest in new
manufacturing equipment, and the market is expected to witness major
opportunities in the near future.
Atomic
layer deposition instruments are expensive as compared to
conventional techniques. Substrates used in atomic layer deposition
instruments are also difficult to obtain when compared to
conventional techniques. This is projected to hamper the growth of
the market to a certain extent. Furthermore, the deposition rate of
atomic layer deposition is slower, which could pose a challenge to
its market growth. Additionally, the industry is capital intensive in
nature, and investment usually occurs during periods of major
technology developments.
Europe,
North America, and Asia Pacific account for majority of the atomic
layer deposition market. Europe has the largest market share followed
by North America and Asia Pacific in the overall atomic layer
deposition market. India and China are expected to be the major
markets for atomic layer deposition in Asia Pacific due to the
presence of established end-user industries. Major semiconductor
manufacturers are shifting their production facilities from developed
economies to emerging economies of Asia Pacific due to the presence
of cheap land, government subsidies, and skilled labor. Hong Kong,
Australia, New Zealand, Republic of Korea, Japan, Vietnam, Malaysia,
and Indonesia are anticipated to be the other major markets in Asia
Pacific.
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